Products
Opus
A standalone product line for reporting, point analysis, I++ device communication, and laser tracker operation — when you need metrology tools outside of SOLIDWORKS.
Overview
Metrology tools that stand on their own
Opus is a family of standalone applications for engineers and inspectors who need metrology capabilities outside of a SOLIDWORKS environment — including reporting, point analysis, device communication, and laser tracker operation.
Standalone operation
No SOLIDWORKS license required. Opus runs independently on any Windows workstation.
Compatible with Sitius CMM Suite
Opus applications share data formats with Sitius CMM Suite — results and reports move seamlessly between environments.
Wide device support
Connect to CMMs, laser trackers, and I++ DME capable devices directly from the Opus environment.
Opus Viewer
View and share inspection results
Free edition
View inspection results and reports without a full Sitius license — share with customers, suppliers, or colleagues.
Paid edition
Extended capabilities for more detailed result navigation, annotations, and export options.
SPV
Standalone Point-to-CAD Comparison
CAD comparison without SOLIDWORKS
Compare point data to CAD geometry and evaluate geometric tolerances outside of the SOLIDWORKS environment.
GD&T analysis
Full geometric tolerance evaluation including best-fit analysis and graphical reporting.
I++ Client for Opus
On-line CMM communication
I++ DME protocol
Connect to any I++ DME capable CMM for on-line measurement directly from the Opus environment.
Standalone operation
No SOLIDWORKS required — drive your CMM and collect data from any workstation running Opus.
Laser Tracker App
Laser tracker operation and data collection
Tracker control
Operate laser trackers directly from Opus — target acquisition, measurement, and data collection in one environment.
Large-scale metrology
Ideal for large parts and assemblies where a CMM is not practical — aerospace structures, tooling, fixtures.
Interested in Opus?
Contact us to learn more about licensing, editions, and supported devices.